Etidronic Acid/ HEDP/CAS:2809-21-4
tsanangudzo
| Chinhu | Magadzirirwo |
| Chitarisiko | Kiristaro chena |
| Zviri mukati zvinoshanda (seasidhi)% | ≥98.0% |
| Zviri mukati zvinoshanda (seHEDP.H)20)% | ≥90.0% |
| PH(1%) | ≤2 |
| Phosphoric acid (sePO43-)% | ≤0.5 |
| Chloride (seCI-)ppm | ≤100 |
| Fe ion ppm | ≤5 |
| Phosphorous acid (sePO33-)% | ≤0.8 |
Kushandiswa
Chigadzirwa ichi ndicho chinhu chikuru chekugadzira electroplating isina cyanide. Kana chakagadzirwa kuita mhinduro ye copper electroplating isina cyanide, chine simba rakanaka rekubatanidza kana chikaisa electroplating zvakananga pamusoro pe sodium iron. Kuputira kwacho kwakatsetseka uye kune kupenya kwakanaka. Kazhinji, chiyero chechigadzirwa chine huwandu hwe60% i100 - 120 ml/L. Chiyero che copper sulfate i15 - 20 g/L. Pamusoro pezvo, usati waisa electroplating, nyika zvikamu zve plating mu 1% - 2% solution yechigadzirwa ichi kuti zvikamu zve plating zviite activated state. Kuisa electroplating mushure medanho iri kunogona kuwedzera mhedzisiro. Hydroxyethylidene diphosphonic acid (HEDP) imhando itsva ye chlorine-free electroplating complexing agent. Inoshandiswa sechinhu chikuru chekugadzirisa hunhu hwemvura mu circulating water system, ichitamba basa rekudzivirira ngura uye kudzivirira scale. Chigadzirwa ichi ndechimwe chezvinhu zve organic polyphosphonic acid treatment water agents. Kunewo mamwe marudzi emhando iyi yezvigadzirwa zvakagadzirwa muChina, zvakaita seamino trimethylene phosphonic acid (ATMP): [CH2PO(OH)2]3N, uye ethylenediamine tetra(methylene phosphonic acid) (EDTMP), nezvimwewo. Organic polyphosphonic acids yakagadzirwa kuma1960 ekupedzisira uye yakaonekwa kuma1970. Kubuda kwemhando iyi yemishonga yekurapa mvura kwakasimudzira tekinoroji yekurapa mvura nedanho guru. Zvichienzaniswa ne inorganic polyphosphates, organic polyphosphonic acids ine kugadzikana kwakanaka kwemakemikari, haisi nyore ku hydrolyze, inogona kutsungirira tembiricha yakakwira, inoda dose diki yemushonga, uye ine hunhu hwekuora uye kudzika kwechiyero. Imhando ye cathodic corrosion inhibitors uye zvakare rudzi rwe non-stoichiometric scale inhibitors. Kana ikashandiswa pamwe chete nedzimwe mishonga yekurapa mvura, inoratidza synergistic effect yakanaka. Iine kugona kwakanaka kwe chelating kune akawanda ma metal ions akadai se calcium, magnesium, copper, uye zinc. Dzinotobatsirawo kubvisa munyu wesimbi idzi, dzakadai seCaSO4, CaCO3, MgSiO3, nezvimwewo. Saka, dzinoshandiswa zvakanyanya mukurapa mvura. Mafosforilating reagents anoshandiswa pakuchengetedza serine nepyranose.
Kurongedza uye Kutumira
Kurongedza: 25kg sezvinodiwa nevatengi.
Kutumirwa: ndekwemakemikari akajairika uye kunogona kutumirwa nechitima, gungwa nemhepo.
Chengeta uye chengeta
Nguva yesherufu: Mwedzi makumi maviri nemana kubva pazuva rekugadzirwa kwayo, yakachengetwa munzvimbo inotonhorera yakaoma isina chiedza chezuva, mvura.
Imba yekuchengetera zvinhu ine mhepo, Inoomesa zvinhu zvishoma, Yakaparadzaniswa nezvinokonzera makemikari, maasidhi.










