Ethyl silicate / CAS 78-10-4
Sharaxaad Gaaban:
Magaca badeecada: Ethyl silicate
CAS: 78-10-4
MF: C8H20O4Si
MW: 208.33
QAAB-DHISMEEDKA:
Cufnaanta: 0.933 g/mL heerkul ah 20 °C (iftiin).
Barta iftiiminta: 116 °F
Dareere aan midab lahayn oo guban kara oo leh ur daran. Aan ku milmin biyaha, ku milmi ethanol, oo si yar ugu milmi benzene.
qeexitaan
| Shay | Tilmaamaha |
| Muuqaalka | Midab aan lahayn Daahfurnaan Dareere ah
|
| Waxyaabaha ku jira Silikoon Dioxide (%)
| 40.0~42.0
|
| C2H5OH(%)
| ≤5.0
|
| APHA (Hz)
| ≤60
|
| Aashitada (HCL)，ppm)
| ≤10
|
| Barta Iftiiminta(℃, Koob xiran)
| ≥37
|
| Cufnaanta (20℃,g/cm3)
| 1.0400~1.0800
|
| Tusmada Refractive (nD25)
| 1.3900～1.4100
|
Isticmaalka
Ethyl silicate (TEOS) waa dareere aan midab lahayn, oo inta badan loo isticmaalo dahaarka kulaylka u adkaysta, dahaarka kiimikada u adkaysta, wakiilada isku xidhka silane, dhexdhexaadiyeyaasha isku-darka dabiiciga ah, iyo horudhac u ah kaydinta uumiga kiimikada (CVD) filimada SiO2 ee goobta semiconductor, iwm. Barta dhalaalka ee ethyl silicate waa -77℃, barta karkarana waa 165.5℃. Waa mid yar ku milma biyaha waxaana lagu milmaa ethanol iyo ether.
Waxaa loo isticmaalaa sidii walax dahaadh ah warshadaha elektaroonigga ah iyo sidoo kale wakiil wax lagu farsameeyo oo loogu talagalay galaaska indhaha iyo isku-xidhka.
Waxaa loo isticmaalaa shubidda saxda ah sida qalab loogu talagalay caaryada ciidda; Dusha birta ah ee lagu daweeyay uumiga ethyl silicate waxay ka hortagi kartaa daxalka iyo biyaha. Ethyl silicate waxaa loo isticmaali karaa in lagu shubo dusha sare ee biraha iyadoo la adeegsanayo silicon, dawaynta galaaska indhaha waxay kordhin kartaa gudbinta iftiinka. Budada silica ee aadka u fiican ee la soo saaro ka dib marka la buuxiyo hydrolysis-ka ayaa loo isticmaali karaa in lagu soo saaro fosfoorasyada. Ethyl silicate waa walaxda ceeriin ee saliidda silikoon. Ethyl silicate waxaa sidoo kale loo isticmaali karaa in lagu soo saaro dahaarka kulaylka u adkaysta iyo kiimikada u adkaysta. Japan, 90% ethyl silicate waxaa loo isticmaalaa agabka saldhigga ah ee dahaarka ka hortagga daxalka (rinjiga zinc-ka hodanka ku ah).
Waxaa inta badan loo isticmaalaa dahaarka kiimikada u adkaysta iyo dahaarka kulaylka u adkaysta, dareerayaasha silikoonka iyo dhejisyada saxda ah. Ka dib marka la sifeeyo, budada silikoon dioxide ee aadka u khafiifsan ayaa la soo saaraa, taas oo loo isticmaalo in lagu sameeyo fosfooraska waxaana sidoo kale loo isticmaali karaa sidii reagent kiimiko ah.
Tetraethoxysilane waxaa inta badan loo isticmaalaa galaaska indhaha, dahaarka kiimikada u adkaysta, dahaarka kulaylka u adkaysta iyo dhejisyada. Wax ka beddelka dahaarka ka hortagga daxalka Wakiilka isku xidhka, xidhaha, wakiilka fuuq-baxa; Soo saarista qalfoofka kiciyaha iyo silica saafiga ah ee aadka u sarreeya.
Ethyl orthosilicate waxaa inta badan loo isticmaalaa galaaska indhaha, dahaarka kiimikada u adkaysta, dahaarka kulaylka u adkaysta iyo dhejisyada. Wax ka beddelka dahaarka ka hortagga daxalka Wakiilka isku xidhka, xidhaha, wakiilka fuuq-baxa; Soo saarista qalfoofka kiciyaha iyo silica saafiga ah ee aadka u fiican.
Qalabka dahaarka ee warshadaha elektaroonigga ah, dahaarka, wakiilada daaweynta muraayadaha indhaha, isku-darka, isku-darka dabiiciga ah, dareereyaasha diyaarinta organosilicon
Isku-darka ku jira ee sameeya H+-magaadiite, wuxuu la falgalaa dodecylamine si loo barto galaaska bioactive ee birta isku dhafan. Waxaa badanaa loo isticmaalaa sidii horudhac marka la diyaarinayo jel qalalan.
Baakadeynta iyo Rarista
Baakad: 200kg sida shuruudaha macaamiisha.
Rarista: waxay ka tirsan tahay kiimikooyinka caadiga ah waxayna ku keeni kartaa tareen, bad iyo hawada.
Saami: waxay haystaan saacad badbaado oo 500MTs ah
Hayso oo kaydi
Muddada shelf-ka: 24 bilood laga bilaabo taariikhda la sameeyay ee baakadaha asalka ah ee aan la furin lagu kaydiyay meel qabow oo qalalan oo ka fog iftiinka qorraxda tooska ah, biyaha.
Bakhaar hawo leh, Qallajin heerkul hooseeya, Ka soocan oksaydhiyeyaasha, asiidhyada.
